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Title: Vapor barrier properties of cold plasma treated corn starch films
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dc.contributor.authorAlbuquerque, Marta Duarte da Fonseca de
dc.contributor.authorBastos, Daniele Cruz
dc.contributor.authorTălu, Stefan
dc.contributor.authorMatos, Robert S.
dc.contributor.authorPires, Marcelo A.
dc.contributor.authorSalerno, Marco
dc.contributor.authorFonseca Filho, Henrique D. da
dc.contributor.authorSimão, Renata A.
dc.date.accessioned2022-10-17T16:30:09Z
dc.date.available2022-10-17T16:30:09Z
dc.date.issued2022
dc.identifier.issn2079-6412
dc.identifier.urihttps://doi.org/10.3390/coatings12071006
dc.language.isoen
dc.publisherCoatings, v.12, n. 7, 2022
dc.subjectAtomic force microscopy
dc.subjectCold plasma
dc.subjectPlasma coatings
dc.subjectHelium
dc.subjectHexamethyldisiloxane
dc.subjectNanostructures
dc.subjectStarch
dc.subjectSurface morphology
dc.titleVapor barrier properties of cold plasma treated corn starch films
dc.typeArticle
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